Effects of strain and local charge on the formation of deep defects in III-V ternary alloys

被引:21
作者
Bonapasta, AA
Giannozzi, P
机构
[1] CNR, Ist Chim Mat, I-00016 Monterotondo, Italy
[2] INFM, Scuola Normale Super Pisa, I-56126 Pisa, Italy
关键词
D O I
10.1103/PhysRevLett.84.3923
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The effects of external and internal strains and of defect charges on the formation of gallium vacancies and arsenic antisites in GaAs and In0.5Ga0.5As have been investigated by ab initio density functional methods, Present results show that a proper understanding of strain and defect charge permits the development of a defect engineering of semiconductors. Specifically, they predict that arsenic antisites in InGaAs ternary alloys can form, upon p-type doping in the presence of an arsenic overpressure, even in the case of high-temperature epitaxial growths.
引用
收藏
页码:3923 / 3926
页数:4
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