Donor level of interstitial hydrogen in GaAs

被引:8
作者
Dobaczewski, L
Nielsen, KB
Larsen, AN
Peaker, AR
机构
[1] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[2] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
[3] Univ Manchester, Ctr Elect Mat Devices & Nanostruct, Manchester M60 1QD, Lancs, England
关键词
hydrogen in GaAs; laplace DLTS; universal level alignment;
D O I
10.1016/j.physb.2005.12.155
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The first data evidencing the existence of the donor level of the interstitial hydrogen in GaAs are presented. The abundant formation of the (0/+) donor level after in situ low-temperature implantation of hydrogen into the depletion layer of GaAs Schottky diodes has been observed and the activation energy and annealing properties have been determined by Laplace DLTS. The activation energy for electron emission of this donor state is 0.14 eV. Above 100 K the hydrogen deep donor state is unstable, converting to a more stable form when there are electrons available for the capture process. A slightly perturbed form of the hydrogen donor in its neutral charge state can be recovered by illuminating the sample. This process releases twice as many electrons as the ionisation process of the hydrogen donor state itself. This fact, by analogy with the silicon case, evidences the negative-U behaviour of hydrogen in GaAs. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:614 / 617
页数:4
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