Mononuclear precursor for MOCVD of HfO2 thin films

被引：29

作者：

Baunemann, A

Thomas, R

Becker, R

Winter, M

Fischer, RA

Ehrhart, P

Waser, R

Devi, A

机构：

[1] Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, Inorgan Mat Chem Grp, D-44780 Bochum, Germany

[2] Forschungszentrum Julich, Inst Festkorperforsch EKM, D-52425 Julich, Germany

来源：

CHEMICAL COMMUNICATIONS | 2004年 / 14期

关键词：

D O I：

10.1039/b405015k

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf((OPr)-Pr-i)(2)(tbaoac)(2)] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.

引用

页码：1610 / 1611

页数：2

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