Diagnostics of the gas-phase thermal decomposition of Si2H6 using vacuum ultraviolet photoionization

被引：33

作者：

Tonokura, K ^{[1
]}

Murasaki, T ^{[1
]}

Koshi, M ^{[1
]}

机构：

[1] Univ Tokyo, Sch Engn, Dept Chem Syst Engn, Bunkyo Ku, Tokyo 1138656, Japan

来源：

CHEMICAL PHYSICS LETTERS | 2000年 / 319卷 / 5-6期

关键词：

D O I：

10.1016/S0009-2614(00)00165-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Vacuum ultraviolet (VUV) photoionization at 10.2 eV was employed for the detection of gas-phase molecules formed after thermal decomposition of disilane at a total pressure of 30 Torr and in the temperature range of 298-740 K. The SinH2(n+1) (n = 3-5) and SinH2n (n = 2-5) species resulting from disilane pyrolysis in a flow reactor were directly observed using time-of-flight mass spectrometry. Unlike multiphoton ionization at 6.4 eV photons, no fragmentation was observed by the VUV single-photon ionization at 10.2 eV. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：507 / 511

页数：5

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