Nucleation and growth of GaN/AlN quantum dots

被引:43
作者
Adelmann, C
Daudin, B
Oliver, RA
Briggs, GAD
Rudd, RE
机构
[1] CEA Grenoble, CEA CNRS, Res Grp Nanophys & Semicond, Dept Rech Fondamentale Mat Condensee, F-38054 Grenoble 9, France
[2] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[3] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
来源
PHYSICAL REVIEW B | 2004年 / 70卷 / 12期
关键词
D O I
10.1103/PhysRevB.70.125427
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We study the nucleation of GaN islands grown by plasma-assisted molecular-beam epitaxy on AlN(0001) in a Stranski-Krastanov mode. In particular, we assess the variation of their height and density as a function of GaN coverage. We show that the GaN growth passes four stages: (i) initially, the growth is layer by layer, (ii) subsequently, two-dimensional precursor islands form, which (iii) transform into genuine three-dimensional islands. Island height and density increase with GaN coverage until the density saturates. (iv) During further GaN growth, the density remains constant and a bimodal height distribution appears. A fit of an equilibrium model for Stranski-Krastanov growth to the variation of island distributions as a function of coverage is discussed.
引用
收藏
页码:125427 / 1
页数:8
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