Structural, dielectric, and ferroelectric properties of PbTiO3 thin films by a simple sol-gel technique

被引:37
作者
Bao, DH
Yao, X
Wakiya, N
Shinozaki, K
Mizutani, N
机构
[1] Tokyo Inst Technol, Dept Met & Ceram Sci, Fac Engn, Meguro Ku, Tokyo, Japan
[2] Xian Jiaotong Univ, Elect Mat Res Lab, Xian 710049, Peoples R China
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2002年 / 94卷 / 2-3期
基金
日本学术振兴会;
关键词
PbTiO3; film; preferential orientation; electrical property; sol-gel;
D O I
10.1016/S0921-5107(02)00131-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
PbTiO3 (PT) thin films were prepared on various substrates by a simple sol-gel technique. The surface morphology and crystal structure, dielectric, and ferroelectric properties of the thin films were investigated. The orientation of PT thin films on Pt/Ti/Si substrates can gradually change with the annealing temperature from a-axis preferential orientation to c-axis preferential orientation. The PT films on Pt/Ti/SiO2/Si substrates have a bi-axis preferential orientation, whereas the films on LaNiO3/SiO2/Si substrates are randomly oriented due to the random orientation of LaNiO3 (LNO) electrode. The dielectric constant, dissipation factor, remanent polarization, coercive field are found to be 143, 0.032, 21.45 muC cm (-2), and 115.3 kV cm (-1), respectively, for the thin films on Pt/Ti/Si, and 115, 0.022, 17.1 muC cm (-2), and 132.1 kV cm (-1), respectively, for the thin films on Pt/Ti/SiO2/Si substrates annealed at 600 degreesC, whereas the remanent polarization and coercive field of PT films on LNO/SiO2/Si substrates annealed at 650 degreesC are 27.345 muC cm (-2) and 71.1 kV cm (-1), respectively. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:269 / 274
页数:6
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