Broad-band and Omnidirectional Antireflection Coatings Based on Semiconductor Nanorods

被引：230

作者：

Diedenhofen, Silke L. ^{[1
]}

Vecchi, Gabriele ^{[1
]}

Algra, Rienk E. ^{[2
,3
]}

Hartsuiker, Alex ^{[4
]}

Muskens, Otto L. ^{[4
]}

Immink, George ^{[5
]}

Bakkers, Erik P. A. M.

Vos, Willem L. ^{[4
,6
]}

Rivas, Jaime Gomez ^{[1
]}

机构：

[1] Philips Res Labs, FOM, Inst Atom & Mol Phys, NL-5656 AE Eindhoven, Netherlands

[2] Mat Innovat Inst M2i, NL-2628 CD Delft, Netherlands

[3] Radboud Univ Nijmegen, Inst Mol & Mat, Dept Solid State Chem, NL-6525 ED Nijmegen, Netherlands

[4] FOM, Inst Atom & Mol Phys, NL-1098 SJ Amsterdam, Netherlands

[5] Philips Res Europe, Miplaza Technol Labs, NL-5656 AE Eindhoven, Netherlands

[6] Univ Twente, MESA, Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 09期

关键词：

GROWTH; METAMATERIALS; LIGHT; GAAS;

D O I：

10.1002/adma.200802767

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A broad-band and omnidirectional antireflection coating consisting of semiconductor nanowires is fabricated. The reflection is reduced due to a graded refractive index, which is achieved by a certain nanorod-length distribution of cylindrical and conically shaped rods. An increased transmission and, accordingly, a reduced reflection are demonstrated for the visible and near-infrared parts of the spectrum.

引用

页码：973 / +

页数：7

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