Hybrid Nanoimprint-Soft Lithography with Sub-15 nm Resolution

被引：138

作者：

Li, Zhiwei ^{[1
]}

Gu, Yanni ^{[1
]}

Wang, Lei ^{[1
]}

Ge, Haixiong ^{[1
]}

Wu, Wei ^{[2
]}

Xia, Qiangfei ^{[2
]}

Yuan, Changsheng ^{[1
]}

Chen, Yanfeng ^{[1
]}

Cui, Bo ^{[3
]}

Williams, R. Stanley ^{[2
]}

机构：

[1] Nanjing Univ, Dept Mat Sci & Engn, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China

[2] Hewlett Packard Corp, Hewlett Packard Labs, Palo Alto, CA 94304 USA

[3] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada

来源：

NANO LETTERS | 2009年 / 9卷 / 06期

基金：

国家高技术研究发展计划(863计划);

关键词：

IMPRINT LITHOGRAPHY; MOLD; FABRICATION; FEATURES; PITCH;

D O I：

10.1021/nl9004892

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 mu m diameter.

引用

页码：2306 / 2310

页数：5

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