Reduction in surface resistivity of polymers by plasma source ion implantation

被引:18
作者
Lim, H
Lee, Y [1 ]
Han, S
Kim, Y
Cho, J
Kim, K
机构
[1] Korea Inst Sci & Technol, Adv Anal Ctr, Seoul 136791, South Korea
[2] Korea Univ, Div Chem & Mol Engn, Seoul 136701, South Korea
关键词
plasma source ion implantation; grid; polymer; surface resistivity;
D O I
10.1016/S0257-8972(02)00365-1
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The surface resistivity of several polymers such as poly (styrene/butadiene copolymer), modified poly (phenyleneoxide), poly(ethylene terephthalate), and polyimide was improved by the argon gas plasma source ion implantation (Ar-PSII) technique equipped with a mesh-type conducting grid. With the grid, the surface resistivities of the modified polymers decreased up to 11 orders of magnitudes at a high ion dose, and remained nearly at the same values after 3 months. The PSII treated polymer sample with the grid provided more uniformly modified surface and lower surface resistivity than that treated without the grid. The extent of the decrease in surface resistivity depended on the polymer structures and physical properties. However, the surface resistivity was independent of the sample thickness, the grid size, and the grid height. Surface analyses using scanning electron microscopy, time-of-flight secondary ion mass spectrometry, and Raman spectroscopy provided the useful information on modified surfaces. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:158 / 164
页数:7
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