Charge state of paramagnetic E′ centre in thermal SiO2 layers on silicon

被引:48
作者
Afanas'ev, VV [1 ]
Stesmans, A [1 ]
机构
[1] Katholieke Univ Leuven, Dept Phys, B-3001 Louvain, Belgium
关键词
D O I
10.1088/0953-8984/12/10/312
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Comparison between the densities of positive charge and paramagnetic E' centres (O(3)drop Si-. defects) generated in thermal SiO2 layers on Si by 10 eV photons at different electric field strengths in the oxide demonstrates that the paramagnetic states cannot be associated with positively charged centres, i.e., the E' centre is neutral. The variation in E' density results from the balance between activation by irradiation and passivation with radiolytic hydrogen. Therefore, the neutral diamagnetic state of the defect is ascribed to the O(3)drop Si-H fragment in the SiO2 network, which is converted into an E' centre by radiation-induced hydrogen cracking.
引用
收藏
页码:2285 / 2290
页数:6
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