Cycloolefin/cyanoacrylate (COCA) copolymers for 193 nm and 157 mn lithography

被引：15

作者：

Dammel, RR ^{[1
]}

Sakamuri, R ^{[1
]}

Lee, SH ^{[1
]}

Rahman, MD ^{[1
]}

Kudo, T ^{[1
]}

Romano, A ^{[1
]}

Rhodes, L ^{[1
]}

Lipian, J ^{[1
]}

Hacker, C ^{[1
]}

Barnes, DA ^{[1
]}

机构：

[1] Clariant Corp, AZ Elect Mat, Somerville, NJ 08876 USA

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2 | 2002年 / 4690卷

关键词：

photoresist; 193; nm; 157; cycloolefin; metal-organic catalysis; free radical polymerization; cyanoacrylate;

D O I：

10.1117/12.474196

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The copolymerization reaction between methyl cyanoacrylate (MCA) and a variety of cycloolefins (CO) was investigated. Cycololefin/cyanoacrylate (COCA) copolymers were obtained in good yields and with lithographically interesting molecular weights for all cycoolefins studied. Anionic MCA homopolymerization could be largely suppressed using acetic acid. Based on NMR data, the copolymerization may tend to a 1:1 CO:MCA incorporation ratio but further work with better suppression of the anionic component is needed to confirm this. Lithographic tests on copolymers of appropriately substituted norbornenes and MCA showed semi-dense and isolated line performance down to 90 nm.

引用

页码：101 / 109

页数：9

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