Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193 nm resist compositions

被引：11

作者：

Rahman, MD ^{[1
]}

McKenzie, D ^{[1
]}

Bae, JB ^{[1
]}

Kudo, T ^{[1
]}

Kim, WK ^{[1
]}

Padmanaban, M ^{[1
]}

Dammel, RR ^{[1
]}

机构：

[1] Clariant Corp, AZ Elect Mat, Somerville, NJ 08876 USA

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2 | 2001年 / 4345卷

关键词：

hybrid copolymer; COMA polymer; 193 resist compositions; methacrylate; cycloolefin-maleic anhydride;

D O I：

10.1117/12.436845

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel process for the preparation of hybrid copolymers based on cycloolefin-maleic anhydride and methacrylate (COMA/Methacrylate) monomers has been developed. A variety of copolymers have been synthesized from t-butylnorbomene carboxylate (BNC), hydroxyethylnorbornene carboxylate (HNC), and norbornene carboxylic acid (NC) with different types of methacrylate monomers such as 2-methyl-2-adamantyl-methacrylate (MAdMA), mevalonic lactone methacrylate (MLMA) and maleic anhydride (MA). The effect of the different types of monomers and the ratios of monomers in the copolymer on lithographic performance has been studied. Lithographic evaluation of some of these polymers has shown resolution down to 80 nm for semi and fully isolated lines using conventional 193 nm illumination and standard development conditions. This paper will report the chemistry of the hybrid polymer platforms and the progress of our effort to develop 193 resist for semi-dense and isolated line applications.

引用

页码：159 / 167

页数：9

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