Tunneling through MnAs particles at a GaAs p+n+ junction

被引:7
作者
Bloom, F. L. [1 ]
Young, A. C.
Myers, R. C.
Brown, E. R.
Gossard, A. C.
Gwinn, E. G.
机构
[1] Univ Calif Santa Barbara, Mat Dept, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, ECE Dept, Santa Barbara, CA 93106 USA
[3] Univ Calif Santa Barbara, Phys Dept, Santa Barbara, CA 93106 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 03期
关键词
D O I
10.1116/1.2190680
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article we examine tunneling through MnAs particles at a GaAs p(+)n(+) junction. We grew the device structures by molecular beam epitaxy on semi-insulating GaAs (001) substrates, with the n(+)(5 x 10(18) cm(-3) Si) and p(+)(2 x 10(19) cm(-3) Be) layers grown at 580 degrees C. At the p+n+ junction, we grew a 30 nm layer of random alloy Ga1-xMnxAs at 250 degrees C. In situ annealing the Ga1-xMnxAs transforms to thermodynamically stable MnAs particles in a GaAs matrix. Magnetization measurements show that the MnAs particles are superparamagnetic with a distribution of blocking temperatures that depends on the annealing protocol. The MnAs particles at the interface are imaged using atomic force microscopy of selectively etched, MnAs-topped nanocolumns. Current-voltage (IV) scans show that the presence of particles increases the forward bias current density. Low-temperature current-voltage (IV) scans confirm an increase in the forward bias current density due to tunneling through MnAs particles. (c) 2006 American Vacuum Society.
引用
收藏
页码:1639 / 1643
页数:5
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