Nickel-germanium soft x-ray zone plates

被引:6
作者
Lindblom, Magnus [1 ]
Reinspach, Julia [1 ]
von Hofsten, Olov [1 ]
Bertilson, Michael [1 ]
Hertz, Hans M. [1 ]
Holmberg, Anders [1 ]
机构
[1] Royal Inst Technol, Dept Appl Phys Biomed & Xray Phys, SE-10691 Stockholm, Sweden
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 03期
关键词
elemental semiconductors; germanium; light diffraction; nanofabrication; nickel; semiconductor thin films; X-ray microscopy; X-ray optics; zone plates; MICROSCOPY; RESOLUTION;
D O I
10.1116/1.3117256
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article presents a fabrication process for soft x-ray zone plates in which nickel and germanium are combined to achieve high diffraction efficiency. A nickel zone plate is first fabricated on a germanium film and then used as a hardmask for a CHF(3)-plasma etch into the germanium. Zone plates with 50-60 nm nickel and 110-150 nm of germanium are presented. The measured diffraction efficiencies were 10%-11% at lambda=2.88 nm, which shows that high efficiency is possible even with thin nickel. Thus, the method has a potential for improving the efficiency of high-resolution zone plates for which the high-aspect-ratio structuring of nickel is difficult.
引用
收藏
页码:L5 / L7
页数:3
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