Tailor-made functionalization of silicon nitride surfaces

被引:67
作者
Arafat, A [1 ]
Schroën, K [1 ]
de Smet, LCPM [1 ]
Sudhölter, EJR [1 ]
Zuilhof, H [1 ]
机构
[1] Wageningen Univ, Lab Organ Chem, NL-6703 HB Wageningen, Netherlands
关键词
D O I
10.1021/ja0483746
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
This communication presents the first functionalization of a hydrogen-terminated silicon-rich silicon nitride (Si3Nx) surface with a well-defined, covalently attached organic monolayer. Properties of the resulting monolayers are monitored by measurement of the static water contact angle, X-ray photoelectron spectroscopy (XPS), and infrared reflection absorption spectroscopy (IRRAS). Further functionalization was performed by reaction of Si3Nx with a trifluoroethanol ester alkene (CH2=CH-(CH2)8CO2CH2CF3) followed by basic hydrolysis to afford the corresponding carboxylic acid-terminated monolayer with hydrophilic properties. These results show that Si3Nx can be functionalized with a tailor-made organic monolayer, has highly tunable wetting properties, and displays significant potential for further functionalization. Copyright © 2004 American Chemical Society.
引用
收藏
页码:8600 / 8601
页数:2
相关论文
共 25 条
[1]   MORPHOLOGY OF LPCVD SI3N4 FILMS AFTER HIGH-TEMPERATURE TREATMENT AND HF ETCHING [J].
BESHKOV, G ;
LAZAROVA, V ;
DIMITROV, DB .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 187 :301-307
[2]   Organometallic chemistry on silicon and germanium surfaces [J].
Buriak, JM .
CHEMICAL REVIEWS, 2002, 102 (05) :1271-1308
[3]   AFM and SNOM characterization of carboxylic acid terminated silicon and silicon nitride surfaces [J].
Cricenti, A ;
Longo, G ;
Luce, M ;
Generosi, R ;
Perfetti, P ;
Vobornik, D ;
Margaritondo, G ;
Thielen, P ;
Sanghera, JS ;
Aggarwal, ID ;
Miller, JK ;
Tolk, NH ;
Piston, DW ;
Cattaruzza, F ;
Flamini, A ;
Prosperi, T ;
Mezzi, A .
SURFACE SCIENCE, 2003, 544 (01) :51-57
[4]   Covalently attached saccharides on silicon surfaces [J].
de Smet, LCPM ;
Stork, GA ;
Hurenkamp, GHF ;
Sun, QY ;
Topal, H ;
Vronen, PJE ;
Sieval, AB ;
Wright, A ;
Visser, GM ;
Zuilhof, H ;
Sudhölter, EJR .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (46) :13916-13917
[5]   Bioengineering of silicon nitride [J].
Gao, H ;
Luginbuhl, R ;
Sigrist, H .
SENSORS AND ACTUATORS B-CHEMICAL, 1997, 38 (1-3) :38-41
[6]   Self-assembled monolayer coatings on nanostencils for the reduction of materials adhesion [J].
Kölbel, M ;
Tjerkstra, RW ;
Kim, G ;
Brugger, J ;
van Rijn, CJM ;
Nijdam, W ;
Huskens, J ;
Reinhoudt, DN .
ADVANCED FUNCTIONAL MATERIALS, 2003, 13 (03) :219-224
[7]   ALKYL MONOLAYERS ON SILICON PREPARED FROM 1-ALKENES AND HYDROGEN-TERMINATED SILICON [J].
LINFORD, MR ;
FENTER, P ;
EISENBERGER, PM ;
CHIDSEY, CED .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1995, 117 (11) :3145-3155
[8]  
Moulder J.F., 1995, HDB XRAY PHOTOELECTR, P40
[9]  
Niederhauser TL, 2002, ANGEW CHEM INT EDIT, V41, P2353, DOI 10.1002/1521-3773(20020703)41:13<2353::AID-ANIE2353>3.0.CO
[10]  
2-B