Study of in-gap defects in intrinsic and B-doped a-Si1-xCx:H by photo-induced optical absorption and photoluminescence

被引:1
作者
Della Corte, Francesco Giuseppe
Grazia Donato, Maria
Gagliardi, Massimo
Messina, Giacomo
Arcangela Nigro, Maria
Santangelo, Saveria
Summonte, Caterina
机构
[1] Mediterranea Univ, Fac Engn, DIMET, I-89060 Reggio Di Calabria, Italy
[2] Mediterranea Univ, Fac Engn, MECMAT, I-89060 Reggio Di Calabria, Italy
[3] CNR, IMM Napoli, I-80131 Naples, Italy
[4] CNR, IMM Bologna, I-40129 Bologna, Italy
关键词
planar waveguides; absorption; luminescence; defects;
D O I
10.1016/j.jnoncrysol.2006.02.071
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The infrared (IR) absorption dependence on visible light illumination has been measured in doped and undoped hydrogenated amorphous silicon carbide (a-Si1-xCx:H) films grown by plasma enhanced chemical vapour deposition. The measurements were made by a highly sensitive technique which exploits properly designed a-Si1-xCx:H/ZnO test waveguides for lengthening the interaction region between the IR and visible (VIS) radiations in the material. Experimental data show that boron doping strongly enhances the VIS light induced variation of the IR absorption, whereas the increase in carbon content has a quenching effect on the phenomenon. The a-SiC:H films have been also characterized by photoluminescence measurements. The spectra are dominated by a photoluminescence band, ranging between 1.4 eV and 1.9 eV. This band is enhanced by the increase in carbon content, while is strongly quenched with increasing B-doping level. On the basis of these results, a correlation is found between the measurements of optical absorption, photo-induced absorption and photoluminescence. The type and the density of defects induced in the films by the different growth conditions have been recognized as the origin of the different behaviors observed. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:2647 / 2651
页数:5
相关论文
共 21 条
[1]   PHYSICS OF AMORPHOUS-SILICON CARBON ALLOYS [J].
BULLOT, J ;
SCHMIDT, MP .
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 1987, 143 (02) :345-418
[2]   In-guide measurement of the infra red absorption variation induced in hydrogenated amorphous silicon by visible radiation [J].
Cantore, F ;
Della Corte, FG ;
Nigro, MA ;
Summonte, C .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 :249-253
[3]  
CODY GD, 1984, SEMICONDUCT SEMIMET, V21, P11
[4]   Low-cost chip-integrable silicon-based all-optical infrared light micromodulator [J].
Della Corte, FG ;
Cantore, F ;
Iodice, M ;
Rendina, I ;
Summonte, C .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002, 299 :1300-1303
[5]   Optoelectronic properties, structure and composition of a-SiC:H films grown in undiluted and H-2 diluted silane-methane plasma [J].
Desalvo, A ;
Giorgis, F ;
Pirri, CF ;
Tresso, E ;
Rava, P ;
Galloni, R ;
Rizzoli, R ;
Summonte, C .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (12) :7973-7980
[6]   Structural and optical properties of a-Si1-xCx:H grown by plasma enhanced CVD [J].
Giorgis, F ;
Ambrosone, G ;
Coscia, U ;
Ferrero, S ;
Mandracci, P ;
Pirri, CF .
APPLIED SURFACE SCIENCE, 2001, 184 (1-4) :204-208
[7]   Optical absorption and luminescence properties of wide-band gap amorphous silicon based alloys [J].
Giorgis, F ;
Mandracci, P ;
Dal Negro, L ;
Mazzoleni, C ;
Pavesi, L .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 :588-592
[8]  
JACKSON WB, 1982, PHYS REV, V25, P5560
[9]  
MORRELL G, 1996, J NON-CRYST SOLIDS, V194, P78
[10]   PHOTOINDUCED MIDGAP ABSORPTION IN TETRAHEDRALLY BONDED AMORPHOUS-SEMICONDUCTORS [J].
OCONNOR, P ;
TAUC, J .
PHYSICAL REVIEW B, 1982, 25 (04) :2748-2766