Nonlinear laser intensity dependence of the formation of carboxylic acid groups at the surface of polymer films: The effect of coupling of radical intermediates

被引:7
作者
Ichinose, N
Tamai, T
Kawanishi, S
Hashida, I
Mizuno, K
机构
[1] OSAKA MUNICIPAL TECH RES INST,JOTO KU,OSAKA 536,JAPAN
[2] UNIV OSAKA PREFECTURE,COLL ENGN,DEPT APPL CHEM,SAKAI,OSAKA 593,JAPAN
关键词
D O I
10.1021/la960949s
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Carboxylic acid groups formed at the surface of poly(4-((trimethylsilyl)methyl)styrene) films upon irradiation with KrF laser pulses at various intensities were analyzed quantitatively. The yield of the acid groups per pulse [acid groups cm(-2) pulse(-1)] as a function of the laser intensity (I, mJ cm(-2) pulse(-1)) was shown to follow a nonlinear relationship; [acid groups cm(-2) pulse(-1)] = Al - BI2 (A and B are constant). The second term, an apparent two-photon process, was attributed to an effect of a coupling reaction of the radical intermediates.
引用
收藏
页码:2603 / 2605
页数:3
相关论文
共 13 条
[1]   SURFACE MODIFICATIONS OF KAPTON AND CURED POLYIMIDE FILMS BY ARF EXCIMER LASER - APPLICATIONS TO IMAGEWISE WETTING AND METALLIZATION [J].
HIRAOKA, H ;
LAZARE, S .
APPLIED SURFACE SCIENCE, 1990, 46 (1-4) :264-271
[2]  
Ivanov VB, 1996, SURF INTERFACE ANAL, V24, P257, DOI 10.1002/(SICI)1096-9918(199604)24:4<257::AID-SIA107>3.0.CO
[3]  
2-1
[4]   SURFACE-PROPERTIES OF POLY(ETHYLENE-TEREPHTHALATE) FILMS MODIFIED BY FAR-ULTRAVIOLET RADIATION AT 193-NM (LASER) AND 185-NM (LOW INTENSITY) [J].
LAZARE, S ;
SRINIVASAN, R .
JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (10) :2124-2131
[5]   PHOTOINDUCED ELECTRON-TRANSFER REACTIONS OF POLY(4-TRIMETHYLSILYLMETHYLSTYRENE) IN THE PRESENCE OF POLYCYANOBENZENES [J].
MIZUNO, K ;
KOBATA, T ;
MAEDA, R ;
OTSUJI, Y .
CHEMISTRY LETTERS, 1990, (10) :1821-1824
[6]  
NAKANISHI K, 1993, THESIS U OSAKA PREFE
[7]   POSITIVELY CHARGED SURFACE-POTENTIAL OF POLYMER-FILMS AFTER EXCIMER LASER ABLATION - APPLICATION TO SELECTIVE-AREA ELECTROLESS PLATING ON THE ABLATED FILMS [J].
NIINO, H ;
YABE, A .
APPLIED PHYSICS LETTERS, 1992, 60 (21) :2697-2699
[8]   KINETICS OF THE ABLATIVE PHOTO-DECOMPOSITION OF ORGANIC POLYMERS IN THE FAR ULTRAVIOLET (193 NM) [J].
SRINIVASAN, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :923-926
[9]   SELF-DEVELOPING PHOTOETCHING OF POLY(ETHYLENE-TEREPHTHALATE) FILMS BY FAR ULTRAVIOLET EXCIMER LASER-RADIATION [J].
SRINIVASAN, R ;
MAYNEBANTON, V .
APPLIED PHYSICS LETTERS, 1982, 41 (06) :576-578
[10]   ULTRAVIOLET-LASER ABLATION OF ORGANIC POLYMERS [J].
SRINIVASAN, R ;
BRAREN, B .
CHEMICAL REVIEWS, 1989, 89 (06) :1303-1316