Evaporation-induced self-assembly (EISA) at its limit: Ultrathin, crystalline patterns by templating of micellar monolayers

被引：73

作者：

Brezesinski, Torsten

Groenewolt, Matthijs

Gibaud, Alain

Pinna, Nicola

Antonietti, Markus

Smarsly, Bernd M.

机构：

[1] Max Planck Inst Colloids & Interfaces, D-14476 Potsdam, Germany

[2] BASF Coatings AG, D-48165 Munster, Germany

[3] Univ Maine, Lab Phys Etat Condense, UMR 6087, CNRS, F-72085 Le Mans, France

[4] Univ Aveiro, Dept Quim, CICECO, P-3810193 Aveiro, Portugal

[5] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany

来源：

ADVANCED MATERIALS | 2006年 / 18卷 / 17期

关键词：

D O I：

10.1002/adma.200600258

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Ultrathin, highly crystalline, mesostructured metal oxide layers, as shown in the figure, have been prepared by sol-gel processing using a modified evaporation-induced self-assembly (EISA) approach. This approach can be exploited for the generation of periodic surface structures featuring a well-defined in-plane mesostructure and a high crystallinity at the same time.

引用

页码：2260 / +

页数：5

共 43 条

[1] X-ray reflectivity study of acid-base post-synthesis treatments of mesoporous thin films templated by P123 [J].