Synthesis of nanocrystalline carbon nitride films by glow discharge plasma beam deposition

被引:5
作者
Hu, Wei [1 ]
Xu, Ning [1 ]
Sheng, Yi-Qun [1 ]
Zhang, Ting-Wei [1 ]
Sun, Jian [1 ]
Wu, Jia-Da [1 ]
Ying, Zhi-Feng [1 ]
机构
[1] Fudan Univ, Dept Opt Sci & Engn, State Key Lab Adv Photon & Devices, Shanghai 200433, Peoples R China
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2006年 / 432卷 / 1-2期
基金
中国国家自然科学基金;
关键词
carbon nitride films; glow discharge; plasma beam deposition;
D O I
10.1016/j.msea.2006.06.080
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Carbon nitride films were deposited on Co/Ni-covered Si(1 0 0) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20-30 nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that beta- and graphitiC-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34-0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323 cm(-1)) that indicates the presence Of C3N4 components, and a graphitic G band (around 1593 cm(-1)). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:142 / 148
页数:7
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