Generation of nano-scaled DNA patterns through electro-beam induced charge trapping

被引:11
作者
Chi, Pei-Yin
Lin, Hung-Yi
Liu, Cheng-Hsien
Chen, Chii-Dong
机构
[1] Natl Tsing Hua Univ, Inst Microelectromech Syst, Hsinchu, Taiwan
[2] Natl Univ Tainan, Dept Mat Sci, Tainan 70005, Taiwan
[3] Natl Chung Hsing Univ, Dept Elect Engn, Taichung 402, Taiwan
关键词
D O I
10.1088/0957-4484/17/19/012
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this study, distinct regions of trapped charges on glass substrates created by electron beam bombardment were utilized to attract and to immobilize DNA molecules. The negatively charged DNA molecules were attracted by the positive charge layer beneath the substrate surface resulting from escape of secondary electrons. With this mechanism, we demonstrated high-precision patterning of unmodified DNA molecules, independent of the length, sequence, and number of DNA strands, and with an attachment to the glass surface strong enough to withstand vigorous washing with water. DNA patterns with the line width of 50 nm were achieved.
引用
收藏
页码:4854 / 4858
页数:5
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