Laser annealing of laser assisted molecular beam deposited ZnO thin films with application to metal-semiconductor-metal photodetectors

被引:27
作者
Li, Meiya
Anderson, Wayne
Chokshi, Nehal
DeLeon, Robert L.
Tompa, Gary
机构
[1] SUNY Buffalo, Dept Elect Engn, Buffalo, NY 14260 USA
[2] AMBP Tech Corp, Tonawanda, NY 14150 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2344811
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the effect of postdeposition laser annealing of undoped zinc oxide (ZnO) thin films grown by laser assisted molecular beam deposition. Hall-effect measurements show that some undoped ZnO films change from n type with mobility values in the range of 200 cm(2) V-1 s(-1) to p-type material with mobility value of 73 cm(2) V-1 s(-1), after laser annealing. The photoconductive behavior was clearly seen on the laser-annealed samples, with values of 0.28 m Omega(-1). The structural and optical properties of the films were improved with laser annealing as shown by scanning electron microscopy, x-ray photoelectron spectroscopy analysis, and photoluminescence measurement. All of the nonlaser and laser annealed samples showed near-band emission at similar to 3.3 eV. Metal-semiconductor-metal photodetectors were fabricated from the films. (c) 2006 American Institute of Physics.
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页数:4
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