Efficient, compact power supply for repetitively pulsed, "triggerless" cathodic arcs

被引：25

作者：

Anders, A ^{[1
]}

MacGill, RA ^{[1
]}

McVeigh, TA ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 12期

关键词：

D O I：

10.1063/1.1150106

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A power supply for "triggerless," repetitively pulsed cathodic arcs has been developed. It is based on a thyristor-switched, high-voltage, high-current, pulse-forming network (PFN). It can provide high pulsed currents (up to 2 kA), with duration of 600 mu s, and pulse repetition rate of up to 10 Hz. Higher repetition rates are possible at lower current. The rectangular pulse shape and amplitude are reproducible to within a few percent. Cathodic arc initiation is extremely reliable because the charging voltage is much higher than the minimum starting voltage for the triggerless arc initiation method. The energy utilization efficiency is very high by intentionally mismatching load and PFN impedances and by using an efficiency-enhancing diode; the stored energy is dissipated primarily in the arc. [S0034-6748(99)02012-2].

引用

页码：4532 / 4535

页数：4

共 7 条

[1] Metal plasma immersion ion implantation and deposition: a review [J].

Anders, A .

SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3) :158-167

[2] 'Triggerless' triggering of vacuum arcs [J].

Anders, A ;

Brown, IG ;

MacGill, RA ;

Dickinson, MR .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (05) :584-587

[3]

BOXMAN RL, 1995, HDB VACUUM SCI TECHN

[4] VACUUM-ARC ION SOURCES [J].

BROWN, IG .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (10) :3061-3082

[5] SOME NOVEL DESIGN-FEATURES OF THE LBL METAL VAPOR VACUUM-ARC ION SOURCES [J].

MACGILL, RA ;

BROWN, IG ;

GALVIN, JE .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (01) :580-582

[6] HIGH-CURRENT ARC - A NEW SOURCE FOR HIGH-RATE DEPOSITION [J].

SIEMROTH, P ;

SCHULKE, T ;

WITKE, T .

SURFACE & COATINGS TECHNOLOGY, 1994, 68 :314-319

[7]

WITKE T, 1998, INT C PLASM SURF ENG

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