Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (II) - Relation between resist space resolution and space distribution of ionic species

For basic research on electron beam lithography, the time-dependent distribution was measured. In the case of nano-scale electron beam lithography, the distribution of ionic species is thought to have an influence on the space resolution or the line edge roughness. As a model compound of a resist resin, liquid n-dodecane was used as a sample. The experiment was carried out using the subpicosecond pulse radiolysis. The experimental data was analyzed by Monte Carlo simulation based on the diffusion in an electric field. The simulation data were convoluted by the response function and fitted to the experimental data. By transforming the time-dependent behavior of cation radicals to the distribution function of cation radical-electron distance, the time-dependent distribution was obtained. Subsequently, the relation between the space resolution and the space distribution of ionic species was discussed.