Photobleachable silicon-containing molecular resist for deep UV lithography

被引：25

作者：

Kim, Jin-Baek

Ganesan, Ramakrishnan

Choi, Jae-Hak

Yun, Hyo-Jin

Kwon, Young-Gil

Kim, Kyoung-Seon

Oh, Tae-Hwan

机构：

[1] Korea Adv Inst Sci & Technol, Dept Chem, Taejon 305701, South Korea

[2] Korea Adv Inst Sci & Technol, Sch Mol Sci BK21, Taejon 305701, South Korea

[3] Korea Atom Energy Res Inst, Adv Radiat Technol Inst, Jeonlabukdo 580185, South Korea

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2006年 / 16卷 / 34期

关键词：

D O I：

10.1039/b606937a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A novel molecular resist material based on polyhedral oligomeric silsesquioxane, possessing diazoketo groups, was successfully synthesized for deep UV lithography. The initial lithographic evaluation of the molecular resist shows the potential of the new platform for the next generation resists.

引用

收藏

页码：3448 / 3451

页数：4

相关论文

共 22 条

[1] Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography [J].

Bellas, V ;

Tegou, E ;

Raptis, I ;

Gogolides, E ;

Argitis, P ;

Iatrou, H ;

Hadjichristidis, N ;

Sarantopoulou, E ;

Cefalas, AC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :2902-2908

[2]

Dammel Ralph., 1993, DIAZONAPHTHOQUINONE

[3] High-resolution patterning of molecular glasses using supercritical carbon dioxide [J].

Felix, NM ;

Tsuchiya, K ;

Ober, CK .

ADVANCED MATERIALS, 2006, 18 (04) :442-+

[4] POLY(PARA-TERT-BUTOXYCARBONYLOXYSTYRENE) - A CONVENIENT PRECURSOR TO PARA-HYDROXYSTYRENE RESINS [J].

FRECHET, JMJ ;

EICHLER, E ;

ITO, H ;

WILLSON, CG .

POLYMER, 1983, 24 (08) :995-1000

[5] Novel photobleachable deep UV resists based on single component nonchemically amplified resist system [J].

Kim, JB ;

Kim, KS .

MACROMOLECULAR RAPID COMMUNICATIONS, 2005, 26 (17) :1412-1417

[6] Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-γ-butyrolactone-2-yl methacrylate)] [J].

Kim, JB ;

Ko, JS ;

Choi, JH ;

Jang, JH ;

Oh, TH ;

Kim, HW ;

Lee, BW .

POLYMER, 2004, 45 (16) :5397-5401

[7] Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists [J].

Kim, JB ;

Ko, JS ;

Jang, JH ;

Choi, JH ;

Lee, BW .

POLYMER JOURNAL, 2004, 36 (01) :18-22

[8] Synthesis of norbornene copolymers with diazo groups and their application as DUV resists [J].

Kim, JB ;

Kim, KS .

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 :655-664

[9]

KWON YG, 2000, J MATER CHEM, V12, P53

[10] Metal substituted diazo esters as substrates for cross coupling reactions [J].

Padwa, A ;

Sa, MM ;

Weingarten, MD .

TETRAHEDRON, 1997, 53 (07) :2371-2386