Macro stress mapping on thin film buckling

被引：3

作者：

Goudeau, P

Villain, P

Renault, PO

Tamura, N

Celestre, RS

Padmore, H

机构：

[1] Univ Poitiers, UMR 6630 CNRS, Met Phys Lab, F-86962 Futuroscope, France

[2] Lawrence Berkeley Lab, Adv Light Source, Berkeley, CA 94270 USA

来源：

ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES | 2002年 / 404-7卷

关键词：

thin film; residual stresses; delamination; micro X-ray diffraction; strain mapping;

D O I：

10.4028/www.scientific.net/MSF.404-407.709

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films deposited by Physical Vapour Deposition techniques on substrates generally exhibit large residual stresses which may be responsible of thin film buckling in the case of compressive stresses. Since the 80's, a lot of theoretical work has been done to develop mechanical models but only a few experimental work has been done on this subject to support these theoretical approaches and nothing concerning local stress measurement mainly because of the small dimension of the buckling (few 10(th) mum). This paper deals with the application of micro beam X-ray diffraction available on synchrotron radiation sources for stress mapping analysis of gold thin film buckling.

引用

页码：709 / 714

页数：6

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