Magnetoresistance and dipole shift of ultrasmall magnetic tunnel junctions characterized by conducting atomic force microscopy

被引:19
作者
Kubota, H
Reiss, G
Brückl, H
Schepper, W
Wecker, J
Gieres, G
机构
[1] Univ Bielefeld, Dept Phys, D-33501 Bielefeld, Germany
[2] Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Aoba Ku, Sendai, Miyagi 9808579, Japan
[3] Siemens AG, Zent Technik MF1, D-91050 Erlangen, Germany
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2002年 / 41卷 / 2B期
关键词
tunnel magnetoresistance; conductive atomic force microscopy; electron beam lithography; magnetization switching; dipole coupling;
D O I
10.1143/JJAP.41.L180
中图分类号
O59 [应用物理学];
学科分类号
摘要
Conducting atomic force microscopy was used for the characterization of magnetic tunnel junctions with various areas down to a minimum of 0.0025 mum(2) and a tunnel magnetoresistance (TMR) value up to 20%. Minor loops of large junctions show jumps, of the resistance, which can be related to magnetic domains formation in the ferromagnetic electrodes. For the smallest junctions, a TMR signal between 10% and 17% was obtained. The range of TMR values increased with decreasing junction,sizes. The minor loops of such small junctions did not show hints of domains. We observed, however, a shift of the minor loop in the opposite direction as obtained for larger junctions, which can be related to dipolar antiferromagnetic coupling of the ferromagnetic electrodes.
引用
收藏
页码:L180 / L182
页数:3
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