Adsorption of hydrogen on clean and modified magnesium films

被引:39
作者
Johansson, Martin
Ostenfeld, Christopher W.
Chorkendorff, Ib [1 ]
机构
[1] Tech Univ Denmark, Danish Natl Res Fdn, CINF, DK-2800 Lyngby KGS, Denmark
[2] Tech Univ Denmark, Dept Phys, Nano DTU, DK-2800 Lyngby KGS, Denmark
关键词
D O I
10.1103/PhysRevB.74.193408
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The sticking of hydrogen on 400 A thick magnesium films, grown under ultrahigh vacuum conditions, have been measured under conditions relevant for hydrogen storage, i.e., elevated temperatures and pressures. A model which describes the hydrogenation and desorption kinetics of the pure magnesium films at H/Mg ratios less than 2% is developed. The activation barrier for hydrogen dissociation is 72 +/- 15 kJ/mole H-2, and a stagnant hydrogen uptake is observed. For platinum-catalyzed films, the barrier is significantly reduced, and there is no stagnation in the uptake rate.
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页数:4
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