Spectroscopic measurement of DC plasma jet in diamond synthesis

被引:6
作者
Sakiyama, S
Fukumasa, O
Murakami, T
Kobayashi, T
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 7B期
关键词
diamond synthesis; plasma jet; spectroscopic measurement; thermal plasma; chemical vapor deposition;
D O I
10.1143/JJAP.36.5003
中图分类号
O59 [应用物理学];
学科分类号
摘要
In synthesis of diamond with a plasma jet under medium pressure, the morphology of the deposited particles depends strongly on the ratio of the methane gas flow rate to the hydrogen gas flow rate and the distance from the feed ring exit to the substrate. The relationship between the morphology of the deposited particles and the chemical species in the plasma jet is studied by means of emission spectroscopy, with a view toward achieving large-area deposition at a high rate. The intensity ratio of the CH to the H-alpha spectrum is strongly correlated with the quality of the diamond synthesized and the deposition area.
引用
收藏
页码:5003 / 5006
页数:4
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