Photoemission studies of the interactions of CdTe and Te with Si(100)

被引:21
作者
Bennett, MR [1 ]
Cafolla, AA [1 ]
Cairns, JW [1 ]
Dunscombe, CJ [1 ]
Williams, RH [1 ]
机构
[1] UWCC,DEPT PHYS & ASTRON,CARDIFF CF2 3YB,S GLAM,WALES
关键词
cadmium telluride; low energy electron diffraction; low index single crystal surfaces; semiconductor-semiconductor interfaces; silicon; soft X-ray photoelectron spectroscopy; surface chemical reaction; tellurium;
D O I
10.1016/0039-6028(96)00645-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The interactions between CdTe, and in particular Te, and the (100) surface of Si have been probed using photoemission and low energy electron diffraction with a view to investigating the mechanisms responsible for (100) and (111) growth orientations for CdTe on Si(100). The interfacial reactions have been studied both on room temperature deposition followed by annealing and on depositions at typical epitaxial growth temperatures. In both cases the same precursor stage of an ordered submonolayer of Te on the Si(100) surface has been identified. Line shape analysis of the Si 2p core level has suggested a structural model in which Te adatoms make up an incomplete monolayer bound in bridge sites, This model is in excellent agreement both with the (1 x 1) LEED pattern and recent SEXAFS studies of this surface. The implications of the cubic symmetry of this surface in terms of the subsequent growth orientation of CdTe are discussed. Termination of the surface by Te was also seen to induce band bending suggestive of Fermi level pinning at around midgap, in contrast to the passivating behaviour of other group VI elements on this surface. The Si 2p core level line shape analysis on termination by Te has also provided evidence to support the ''covalent dimer'' interpretation of the clean dimerised Si(100) surface.
引用
收藏
页码:187 / 199
页数:13
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