Luminescence studies of a Si/SiO2 superlattice

被引:70
作者
Averboukh, B
Huber, R
Cheah, KW [1 ]
Shen, YR
Qin, GG
Ma, ZC
Zong, WH
机构
[1] Hong Kong Baptist Univ, Dept Phys, Kowloon Tong, Hong Kong, Peoples R China
[2] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
[3] Peking Univ, Dept Phys, Beijing 100871, Peoples R China
[4] Minist Elect Ind, Inst 13, Natl Lab GaAs IC, Shijiazhuang 050051, Peoples R China
关键词
D O I
10.1063/1.1498960
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence and electroluminescence from a Si/SiO2 superlattice have been measured. They show similar characteristics and exhibit an inhomogeneously broadened photoluminescence band peaked at 2.06 eV. The excitation spectrum indicates that excitations occur in the Si layers. The insensitivity of the luminescence spectrum and decay to temperature and excitation wavelength suggests that luminescence originates from transitions between localized defect states. These localized states are most likely defect states residing at the Si/SiO2 interfaces, because there should be a significant concentration of defects at the interface and SiO2 due to the large lattice mismatch and the amorphous state. The close proximity of these states offers a more rapid transition path for the excited electrons. An energy band diagram of the superlattice is constructed based on our results. (C) 2002 American Institute of Physics.
引用
收藏
页码:3564 / 3568
页数:5
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