Algorithms for calculating single-atom step heights

被引：31

作者：

Fu, J ^{[1
]}

Tsai, V ^{[1
]}

Köning, R ^{[1
]}

Dixson, R ^{[1
]}

Vorburger, T ^{[1
]}

机构：

[1] NIST, Div Precis Engn, Gaithersburg, MD 20899 USA

来源：

NANOTECHNOLOGY | 1999年 / 10卷 / 04期

关键词：

D O I：

10.1088/0957-4484/10/4/312

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Recently, our work on the measurement of Si(lll)single atomic steps has prompted us to investigate the algorithm for the calculation of a one-sided step height. We compared the results of a two-point subtraction and a histogram technique under different conditions of surface tilt with respect to the measuring frame. By evaluating a simulated Si(lll)atomic step, we found its calculated height could deviate from the true value as high as 2% due to a misalignment of the measuring axis and sample axis of 0.1 degrees.

引用

页码：428 / 433

页数：6

共 6 条

[1]

*ASME, 1995, SURF TEXT SURF ROUGH, V46, P1

[2]

BOAS ML, 1966, MATH METHODS PHYSICA

[3]

SEILER DG, 1998, AIP C P, V449, P839

[4] MONOATOMIC STEP OBSERVATION ON SI(111) SURFACES BY FORCE MICROSCOPY IN AIR [J].

SUZUKI, M ;

KUDOH, Y ;

HOMMA, Y ;

KANEKO, R .

APPLIED PHYSICS LETTERS, 1991, 58 (20) :2225-2227

[5] Standardized procedure for calibrating height scales in atomic force microscopy on the order of 1 nm [J].

Suzuki, M ;

Aoyama, S ;

Futatsuki, T ;

Kelly, AJ ;

Osada, T ;

Nakano, A ;

Sakakibara, Y ;

Suzuki, Y ;

Takami, H ;

Takenobu, T ;

Yasutake, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03) :1228-1232

[6] TERRACE-WIDTH DISTRIBUTIONS ON VICINAL SI(111) [J].

WANG, XS ;

GOLDBERG, JL ;

BARTELT, NC ;

EINSTEIN, TL ;

WILLIAMS, ED .

PHYSICAL REVIEW LETTERS, 1990, 65 (19) :2430-2433

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