Model for reactive sputtering Optimisation results for YBaCuO thin films deposited on polycrystalline zirconia substrates

被引：8

作者：

Degardin, A ^{[1
]}

Caristan, E ^{[1
]}

Pech, T ^{[1
]}

Kreisler, A ^{[1
]}

机构：

[1] UNIV PARIS 11, SUPELEC, CNRS, URA 127, LGEP, F-91192 GIF SUR YVETTE, FRANCE

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 1997年 / 251卷 / 1-2期

关键词：

reactive sputtering; YBaCuO thin films;

D O I：

10.1016/S0925-8388(96)02779-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In order to study in situ elaboration of YBaCuO thin films sputtered on polycrystalline YSZ substrates, a model of reactive sputtering has been developed. c-axis oriented YBaCuO films were obtained with J(c) approximate to 3 x 10(4) A/cm(2) at 77 K measured on 55 x 55 mu m(2) microbridges.

引用

页码：107 / 110

页数：4

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