Trends in porous silicon biomedical devices - Tuning microstructure and performance trade-offs in optical biosensors

被引:12
作者
DeLouise, LA [1 ]
Miller, BL [1 ]
机构
[1] Univ Rochester, Ctr Med, Dept Dermatol, Rochester, NY 14622 USA
来源
OPTOELECTRONIC INTEGRATION ON SILICON | 2004年 / 5357卷
关键词
D O I
10.1117/12.527578
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High surface area mesoporous silicon microcavities are investigated for direct detect optical biosensor applications. Device quality is reported as a function of fabrication parameters. A dilute KOH etch process is utilized to modify the intrinsic 3D microstructure to enable enhanced pore infiltration of large biomolecules. Results suggest that the KOH etch mechanism is a two step process consisting of a fast step where high surface area nanostructures are rapidly removed. This is followed by a slower step where silicon is removed from the pore channel walls. The enzyme, Glutathione-S-Transferase (50kDa), is utilized to probe pore infiltration. Results from a solid phase immobilized enzyme assay support our conclusions on the impact the KOH etch step has on modifying the porous silicon microstructure. Preliminary findings point to trade-offs that exists between optimizing microstructure with microcavity operation mode and device sensitivity.
引用
收藏
页码:111 / 125
页数:15
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