Micromachined silicon resonant strain gauges fabricated using SOI wafer technology

被引:29
作者
Beeby, SP [1 ]
Ensell, G
Baker, BR
Tudor, MJ
White, NM
机构
[1] Univ Southampton, Dept Elect & Comp Sci, Southampton SO17 1BJ, Hants, England
[2] ERA Technol, Surrey KT22 7SA, England
关键词
D O I
10.1109/84.825784
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The optimum mode of double-ended tuning-fork-style resonators is a lateral vibration in the plane of the wafer. Lateral vibrations are typically excited using the comb drive approach, but this requires modification to the resonator structure. This paper reports a simple method for exciting and detecting lateral vibrations without modifying the resonator, thereby enabling the optimum dynamically balanced structure to be used, This approach uses plane electrodes positioned parallel to the resonator's tines to excite the vibrations while the change in resistance along the length of the resonator enables the vibrations to be detected. Test devices have been fabricated in single-crystal silicon using the buried oxide in silicon-on-insulator wafers as a sacrificial layer. The resonators are 340-mu m long, 3-mu m thick with tines 2-mu m wide. The gap between the tines and the electrode is 2 mu m, Visual inspection in a scanning electron microscope and electrical tests have confirmed the validity of this approach. [475].
引用
收藏
页码:104 / 111
页数:8
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