Silicon micromachining for millimeter-wave applications

被引：2

作者：

Guillon, B ^{[1
]}

Grenier, K

Pons, P

Cazaux, JL

Lalaurie, JC

Cros, D

Plana, R

机构：

[1] CNRS, LAAS, F-31077 Toulouse 04, France

[2] Alcatel Space, F-31037 Toulouse, France

[3] CNES Toulouse, F-31055 Toulouse, France

[4] IRCOM, F-87000 Limoges, France

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2000年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.582170

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We present in this article a very low loss silicon micromachined coplanar technology. The design of the structures was achieved through three dimensional finite element method electromagnetic simulations. A silicon micromachined cavity resonating at 95 GHz with a quality factor greater than 9000 was realized. (C) 2000 American Vacuum Society. [S0734-2101(00)09202-2].

引用

页码：743 / 745

页数：3

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