InGaAs-InP mesa DHBTs with simultaneously high fT and fmax and low Ccb/Ic ratio

被引:15
作者
Griffith, Z [1 ]
Dahlström, M
Urteaga, M
Rodwell, MJW
Fang, XM
Lubysbev, D
Wu, Y
Fastenau, JM
Liu, WK
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[2] IQE Inc, Bethlehem, PA 18015 USA
关键词
heterojunction bipolar transistor (HBT);
D O I
10.1109/LED.2004.827288
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report an InP-InGaAs-InP double heterojunction bipolar transistor (DHBT), fabricated using a conventional triple mesa structure, exhibiting a 370-GHz f(tau) and 459-GHz f(max), which is to our knowledge the highest f(tau) reported for a mesa InP DHBT-as well as the highest simultaneous f(tau) and f(max) for any mesa HBT. The collector semiconductor was undercut to reduce the base-collector capacitance, producing a C-cb/I-c ratio of 0.28 ps/V at V-cb = 0.5 V. The V-BR,V-CEO is 5.6 V and the devices fail thermally only at > 18 mW/mum(2), allowing dc bias from J(e) = 4.8 mA/mum(2) at V-ce = 3.9 V to J(e) = 12.5 mA/mum(2) at V-ce = 1.5 V. The device employs a 30 nm carbon-doped InGaAs base with graded base doping, and an InGaAs-InAlAs superlattice grade in the base-collector junction that contributes to a total depleted collector thickness of 150 nm.
引用
收藏
页码:250 / 252
页数:3
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