Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions

被引：34

作者：

Chen, CS ^{[1
]}

Liu, CP ^{[1
]}

Tsao, CYA ^{[1
]}

Yang, HG ^{[1
]}

机构：

[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan

来源：

SCRIPTA MATERIALIA | 2004年 / 51卷 / 07期

关键词：

zirconium; sputtering; scratch test; hardness and toughness;

D O I：

10.1016/j.scriptamat.2004.06.005

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The ZrN films were grown on Si substrates using dc magnetron sputtering where the substrate bias is varied from -45 to 50 V. The positive substrate bias increases in hardness and elastic modulus, while negative bias enhances hardness and toughness. (C) 2004 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：715 / 719

页数：5

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