STRUCTURAL-ANALYSIS OF ZR-N AND TI-N FILMS PREPARED BY REACTIVE PLASMA BEAM DEPOSITION

被引：40

作者：

PANJAN, P

NAVINSEK, B

ZABKAR, A

MARINKOVIC, V

MANDRINO, D

FISER, J

机构：

[1] Jožef Stefan Institute, 61111 Ljubljana

来源：

THIN SOLID FILMS | 1993年 / 228卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(93)90606-P

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of composition of Zr-N and Ti-N films and deposition temperature on lattice expansion was investigated. Zr-N and Ti-N films containing various at.% of nitrogen were prepared by reactive sputter deposition in a Balzers Sputron plasma beam apparatus. Both Zr-N and Ti-N films were grown at a substrate temperature of 180-degrees-C and some of the ZrN films also at substrate temperatures between 400 and 700-degrees-C. Interplanar distances and textures were determined using Seemann-Bohlin and Bragg-Brentano X-ray diffraction.

引用

页码：233 / 237

页数：5

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