X-ray diffraction study of alternating nanocrystalline silicon/amorphous silicon multilayers

Structural properties of alternating nanocrystalline silicon/amorphous silicon multilayers with visible light emission at room temperature were examined by means of x-ray diffraction. According to the line widths and intensities of the diffraction peaks in the low- and high-angle ranges, we have determined the effective interface thickness, the mean crystallite sizes, and the internal strains, which are closely related to the photoluminescence in this material. In addition, the existence of the voids or holes was also observed, indicating that the improved electrical properties of this kind of hydrogenated nanocrystalline materials are due to the inhomogeneous structure of the material. (C) 1997 American Institute of Physics.