Stacking effects on the electronic and optical properties of bilayer transition metal dichalcogenides MoS2, MoSe2, WS2, and WSe2

被引:467
作者
He, Jiangang [1 ,2 ]
Hummer, Kerstin [1 ]
Franchini, Cesare [1 ]
机构
[1] Univ Vienna, Fac Phys, Dept Computat Mat Phys, A-1090 Vienna, Austria
[2] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA
关键词
MONOLAYER MOS2; LAYER MOS2; CRYSTAL; GAS; PHOTOLUMINESCENCE; DYNAMICS;
D O I
10.1103/PhysRevB.89.075409
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Employing the random phase approximation we investigate the binding energy and Van der Waals (vdW) interlayer spacing between the two layers of bilayer transition metal dichalcogenides MoS2, MoSe2, WS2, and WSe2 for five different stacking patterns, and examine the stacking-induced modifications on the electronic and optical/excitonic properties within the GW approximation with a priori inclusion of spin-orbit coupling and by solving the two-particle Bethe-Salpeter equation. Our results show that for all cases, the most stable stacking order is the high symmetry AA' type, distinctive of the bulk like 2H symmetry, followed by the AB stacking fault, typical of the 3R polytypism, which is by only 5 meV/formula unit less stable. The conduction band minimum is always located in the midpoint between K and Gamma, regardless of the stacking and chemical composition. All MX2 undergo an direct-to-indirect optical gap transition going from the monolayer to the bilayer regime. The stacking and the characteristic vdW interlayer distance mainly influence the valence band splitting at K and its relative energy with respect to Gamma, as well as, the electron-hole binding energy and the values of the optical excitations.
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页数:11
相关论文
共 95 条
[1]   Density-functional-theory calculations of electronic band structure of single-crystal and single-layer WS2 -: art. no. 073413 [J].
Albe, K ;
Klein, A .
PHYSICAL REVIEW B, 2002, 66 (07) :1-3
[2]   The GW method [J].
Aryasetiawan, F ;
Gunnarsson, O .
REPORTS ON PROGRESS IN PHYSICS, 1998, 61 (03) :237-312
[3]   Are we van der Waals ready? [J].
Bjorkman, T. ;
Gulans, A. ;
Krasheninnikov, A. V. ;
Nieminen, R. M. .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2012, 24 (42)
[4]   van der Waals Bonding in Layered Compounds from Advanced Density-Functional First-Principles Calculations [J].
Bjorkman, T. ;
Gulans, A. ;
Krasheninnikov, A. V. ;
Nieminen, R. M. .
PHYSICAL REVIEW LETTERS, 2012, 108 (23)
[5]   PROJECTOR AUGMENTED-WAVE METHOD [J].
BLOCHL, PE .
PHYSICAL REVIEW B, 1994, 50 (24) :17953-17979
[6]   Field-Effect Tunneling Transistor Based on Vertical Graphene Heterostructures [J].
Britnell, L. ;
Gorbachev, R. V. ;
Jalil, R. ;
Belle, B. D. ;
Schedin, F. ;
Mishchenko, A. ;
Georgiou, T. ;
Katsnelson, M. I. ;
Eaves, L. ;
Morozov, S. V. ;
Peres, N. M. R. ;
Leist, J. ;
Geim, A. K. ;
Novoselov, K. S. ;
Ponomarenko, L. A. .
SCIENCE, 2012, 335 (6071) :947-950
[7]  
BRONSEMA KD, 1986, Z ANORG ALLG CHEM, V541, P15
[8]   Tkatchenko-Scheffler van der Waals correction method with and without self-consistent screening applied to solids [J].
Bucko, Tomas ;
Lebegue, S. ;
Hafner, Juergen ;
Angyan, J. G. .
PHYSICAL REVIEW B, 2013, 87 (06)
[9]   Improved Description of the Structure of Molecular and Layered Crystals: Ab Initio DFT Calculations with van der Waals Corrections [J].
Bucko, Tomas ;
Hafner, Juergen ;
Lebegue, Sebastien ;
Angyan, Janos G. .
JOURNAL OF PHYSICAL CHEMISTRY A, 2010, 114 (43) :11814-11824
[10]   Local Strain Engineering in Atomically Thin MoS2 [J].
Castellanos-Gomez, Andres ;
Roldan, Rafael ;
Cappelluti, Emmanuele ;
Buscema, Michele ;
Guinea, Francisco ;
van der Zant, Herre S. J. ;
Steele, Gary A. .
NANO LETTERS, 2013, 13 (11) :5361-5366