Prerequisite for photoluminescence D line spectra of heat-treated carbon-lean Czochralski silicon crystals

被引:15
作者
Cho, KH
Lee, JY
Suh, EK
Kim, KW
机构
[1] KOREA ADV INST SCI & TECHNOL,DEPT ELECT MAT ENGN,TAEJON 305701,SOUTH KOREA
[2] CHONBUK NATL UNIV,DEPT PHYS,CHONJU 560756,SOUTH KOREA
[3] CHONBUK NATL UNIV,SEMICOND PHYS RES CTR,CHONJU 560756,SOUTH KOREA
[4] KYUNGPOOK NATL UNIV,SCH ELECT & ELECT ENGN,TAEGU 702701,SOUTH KOREA
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 1A期
关键词
Czochralski silicon crystal; photoluminescence D lines; simulated MOS thermal cycles; planar-type defect; 60 degrees-type dislocation; stacking fault; Cu contamination;
D O I
10.1143/JJAP.36.1
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a systematic experimental investigation on the prerequisite for D Line luminescence at the photon energies of 0.81 and 0.87eV in heat-treated carbon-lean Czochralski (CZ) silicon crystals. For examination of the influence of a transition metal on photoluminescence D lines, carbon-lean CZ silicon wafers annealed using simulated MOS thermal cycles were deliberately contaminated with Cu. The results show that the presence of specific extended defects, i.e., planar-type defects bounded by {111} planes and composed of 60 degrees-type dislocations and stacking faults in this experiment, is a prerequisite for the generation of D1 and D2 lines in heat-treated carbon-lean CZ silicon crystals, and that the diffusion of Cu into the heat-treated samples reduces the D2 line intensity significantly whereas it enhances D1 line luminescence up to a certain level of Cu contamination.
引用
收藏
页码:1 / 5
页数:5
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