Properties of nanocrystalline diamond thin films grown by MPCVD for biomedical implant purposes

Nanocrystalline diamond (NCD) thin films have been grown by microwave plasma chemical vapor deposition (MPCVD) and investigated to determine their suitability for biomedical applications. Growth conditions were chosen to produce very uniform films over the surface of curved temporomandibular joint implants. These parameters include methane flow rates exceeding 20% of the hydrogen gas flow rate, and chamber pressure and microwave power were maintained at 30 Torr and 0.73 M, respectively, in a Wavemat 6 kW MPCVD device. Films (3 mum thick) that completely coated 2.54-cm-diameter Ti-6Al-4V disks under these conditions exhibit mean grain size of 30.4 nm as determined by XRD peak broadening, hardness of 80 GPa as determined by nanoindentation, RMS mean roughness of 15.3 +/- 5.3 nm as determined by stylus profilometry, and film adhesion toughness (Gamma(C)) of 158 j/m(2) as determined by a Rockwell indentation method. Similar deposition performed on small Ti-6Al-4V hemispheres produce films with smaller mean grain size of 21.1 nm and correspondingly lower hardness and roughness. Overall, these films exhibit properties well suited for use in biomedical applications. (C) 2004 Elsevier B.V. All rights reserved.