Atom lithography with a cold, metastable neon beam

被引：26

作者：

Engels, P ^{[1
]}

Salewski, S ^{[1
]}

Levsen, H ^{[1
]}

Sengstock, K ^{[1
]}

Ertmer, W ^{[1
]}

机构：

[1] Univ Hannover, Inst Quantenopt, D-31067 Hannover, Germany

来源：

APPLIED PHYSICS B-LASERS AND OPTICS | 1999年 / 69卷 / 5-6期

关键词：

D O I：

10.1007/s003400050827

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We study different aspects of atom lithography with metastable neon atoms. Proximity printing of stencil masks is used to test suitable resists that are sensitive to the internal energy of the atoms, including dodecanethiols on gold and octadecyltrichlorosilanes grown on a SiO2 surface. As an example of patterning the atomic beam with laser light, we create parallel line structures on the surface with a periodicity of half the laser wavelength by locally de-exciting the atoms in a standing quenching wave.

引用

页码：407 / 412

页数：6

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