Double-dot-like charge transport through a small size silicon single electron transistor

被引:10
作者
Choi, BH
Yu, YS
Kim, DH
Son, SH
Cho, KH
Hwang, SW [1 ]
Ahn, D
Park, BG
机构
[1] Korea Univ, Sch Elect Engn, Sungbuk Ku, Seoul 136075, South Korea
[2] Univ Seoul, Inst Quantum Informat Proc & Syst, Dongdaemun Ku, Seoul 130743, South Korea
[3] Seoul Natl Univ, Sch Elect Engn, Kwanak Gu, Seoul 151742, South Korea
关键词
Si quantum dot; double dot; transport; single electron transistor;
D O I
10.1016/S1386-9477(02)00241-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report double dot like charge transport in a Si single electron transistor with a single fabricated dot. Detailed analysis of the transport data suggests the existence of another quantum dot with a size much larger than the fabricated dot. More importantly. it is shown that the Coulomb oscillations observed at high temperature clearly originate from the fabricated dot, Possible origin of the accidental formation of the second quantum dot is either a defect at the Si buried Oxide interface or a defect in the thermal oxide surrounding the Si quantum wire. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:946 / 949
页数:4
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