Evidence from spectral emissometry for conduction intraband transitions in the intrinsic regime for silicon

被引:1
作者
Abedrabbo, S [1 ]
Hensel, JC
Fiory, AT
Ravindra, NM
机构
[1] Kearfott Guidance & Navigat Corp, Little Falls, NJ 07424 USA
[2] New Jersey Inst Technol, Newark, NJ 07102 USA
[3] Lucent Technol, Murray Hill, NJ USA
关键词
spectral emissometry; absorption band; intraband transitions; conduction band edge; temperature; emissivity;
D O I
10.1007/s11664-999-0127-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
From emissometry measurements in lightly doped Si at elevated temperatures, we have observed an anomalous absorption band in the wavelength range of 1-5 mu m. The wavelength at which the band peaks, lambda approximate to 2.3 mu m, shows a negligible dependence on temperature while the peak intensity increases with temperature presumably as a result of the increasing intrinsic carrier concentration. Spitzer and Fan reported a similar absorption band in direct absorption measurements at room temperature for n-type Si with extrinsic electron concentrations of 10(14) to 10(19)cm(-3). No such structure was found in extrinsic p-type Si. Spitzer and Fan were unable to identify the mechanism for this anomalous absorption. In both the experiments, this absorption of free electrons is due to intraband transitions in the conduction band from the Delta(1) conduction band edge across an energy gap of E similar to 0.5 eV to a higher lying Delta(2)' conduction band.
引用
收藏
页码:1390 / 1393
页数:4
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