Pyramidal texturing of silicon solar cell with TMAH chemical anisotropic etching

被引:278
作者
Papet, P. [1 ]
Nichiporuk, O. [1 ]
Kaminski, A. [1 ]
Rozier, Y. [1 ]
Kraiem, J. [1 ]
Lelievre, J. -F. [1 ]
Chaumartin, A. [1 ]
Fave, A. [1 ]
Lemiti, M. [1 ]
机构
[1] Inst Natl Sci Appl, Lab Phys Mat, CNRS, UMR 5511, F-69621 Villeurbanne, France
关键词
solar cells; texturing; light trapping; reflectance; TMAH;
D O I
10.1016/j.solmat.2006.03.005
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
High-efficiency silicon solar cells need a textured front surface to reduce reflectance and to improve light trapping. Texturing of monocrystalline silicon is usually done in alkaline solutions. These solutions are cheaper, but are pollutants of silicon technologies. In this paper, we investigate an alternative solution containing tetramethyl ammonium hydroxide ((CH3)(4)NOH, TMAH). This study shows the influence of different parameters (concentration, agitation, duration and temperature), to obtain uniform and reliable pyramidal texturization on different silicon surfaces (as cut, etched and polished). Under optimized conditions, TMAH-textured surface led to an average weighted reflectance of 13%, without any antireflection coating independent of the initial silicon surface. Unlike potassium hydroxide (KOH) texturing solution, characterization of silicon oxide layer contamination after TMAH texturing process revealed no pollution, and passivation is less affected by TMAH than by KOH texturization. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:2319 / 2328
页数:10
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