Microwave characterization of coplanar waveguide transmission lines fabricated by ion implantation patterning of YBa2Cu3O7-delta

被引：5

作者：

Booth, JC ^{[1
]}

Beall, JA ^{[1
]}

DeGroot, DC ^{[1
]}

Rudman, DA ^{[1
]}

Ono, RH ^{[1
]}

Miller, JR ^{[1
]}

Chen, ML ^{[1
]}

Hong, SH ^{[1
]}

Ma, QY ^{[1
]}

机构：

[1] COLUMBIA UNIV,NEW YORK,NY

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1997年 / 7卷 / 02期

关键词：

D O I：

10.1109/77.621814

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report on the application of Si and Al ion-implantation patterning to the fabrication of low-loss microwave transmission lines in high-temperature superconductor (HTS) thin films, Using this technique, we have fabricated coplanar waveguide (CPW) transmission lines in YBa2Cu3O7-delta (YBCO) thin films deposited on LaAlO3 substrates. We have used both resonant and broadband measurements in order to characterize the performance of the resulting transmission line structures, For the broadband measurements, on-wafer calibrations were used to obtain accurate S-parameters and transmission line propagation constants up to 25 GHz, The propagation constants of the ion-implanted transmission lines do not differ significantly from those of lines patterned using conventional ion over the frequency range studied, with a value for the attenuation constant of approximately 0.03-0.04 dB/cm at 50 K and 10 GHz. The relatively low losses of the ion-implanted devices demonstrate the effectiveness of this method of patterning for HTS microwave device fabrication.

引用

页码：2780 / 2783

页数：4

共 8 条

[1] Planar microwave devices fabricated by ion-implantation patterning of high-temperature superconductors [J].