A novel multilayer circuit process using YBa2Cu3Ox/SrTiO3 thin films patterned by wet etching and ion milling

被引：8

作者：

Li, HQ ^{[1
]}

Ono, RH ^{[1
]}

Vale, LR ^{[1
]}

Rudman, DA ^{[1
]}

Liou, SH ^{[1
]}

机构：

[1] UNIV NEBRASKA,DEPT PHYS,LINCOLN,NE 68588

来源：

APPLIED PHYSICS LETTERS | 1996年 / 69卷 / 18期

关键词：

D O I：

10.1063/1.117700

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A process combining hydrofluoric acid (HF) and Ar+ ion milling has been used to make YBa2Cu3Ox/SrTiO3/YBa2Cu3Ox(YBCO/STO/YBCO multilayer test circuits. Low-angle steps can be readily etched in STO and YBCO films with this process. YBCO lines crossing 5 degrees steps have about the same critical temperature T-c (89-99 K) and critical current density J(c) (>1x10(6) A/cm(2) at 86 K) as lines on planar surfaces. Via connections have the same T-c as other circuit components and adequate critical currents for most circuit designs. (C) 1996 American Institute of Physics.

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页码：2752 / 2754

页数：3

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