Conductive indium-doped zinc oxide films prepared by atmospheric-pressure chemical vapour deposition

被引:62
作者
Nishino, J
Kawarada, T
Ohshio, S
Saitoh, H
Maruyama, K
Kamata, K
机构
[1] Department of Chemistry, Nagaoka University of Technology, Nagaoka
关键词
D O I
10.1023/A:1018511131738
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:629 / 631
页数:3
相关论文
共 6 条
[1]   INDIUM-DOPED ZINC-OXIDE FILMS PREPARED BY DC MAGNETRON SPUTTERING [J].
CZTERNASTEK, H ;
BRUDNIK, A ;
JACHIMOWSKI, M .
SOLID STATE COMMUNICATIONS, 1988, 65 (09) :1025-1029
[2]   RAPID FORMATION OF ZINC-OXIDE FILMS BY AN ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION METHOD [J].
KAMATA, K ;
NISHINO, J ;
OHSHIO, S ;
MARUYAMA, K ;
OHTUKI, M .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (02) :505-508
[3]   EFFECT OF HYDROGEN PLASMA TREATMENT ON TRANSPARENT CONDUCTING OXIDES [J].
MAJOR, S ;
KUMAR, S ;
BHATNAGAR, M ;
CHOPRA, KL .
APPLIED PHYSICS LETTERS, 1986, 49 (07) :394-396
[4]   HIGHLY TRANSPARENT AND CONDUCTING INDIUM-DOPED ZINC-OXIDE FILMS BY SPRAY PYROLYSIS [J].
MAJOR, S ;
BANERJEE, A ;
CHOPRA, KL .
THIN SOLID FILMS, 1983, 108 (03) :333-340
[5]   PREPARATION OF ALUMINUM-DOPED ZINC-OXIDE FILMS BY A NORMAL-PRESSURE CVD METHOD [J].
NISHINO, J ;
OHSHIO, S ;
KAMATA, K .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1992, 75 (12) :3469-3472
[6]   LOW-COST, NON-VACUUM TECHNIQUES FOR THE PREPARATION OF THIN THICK-FILMS FOR PHOTOVOLTAIC APPLICATIONS [J].
OKTIK, S .
PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS, 1988, 17 (03) :171-240