Stability of InAs quantum dots

被引:40
作者
Heyn, C
机构
[1] Inst Angew Phys, D-20355 Hamburg, Germany
[2] Zentrum Mikrostrukt Forsch, D-20355 Hamburg, Germany
来源
PHYSICAL REVIEW B | 2002年 / 66卷 / 07期
关键词
D O I
10.1103/PhysRevB.66.075307
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We monitor the postgrowth desorption of self-assembled InAs quantum dots with electron diffraction. A kinetic model is presented that quantitatively describes the temperature and arsenic pressure dependence of the postgrowth dot lifetimes. The central findings establish the stabilization of the InAs quantum dots by an arsenic flux, the importance of the precursor state for the impinging arsenic molecules, and layer-by-layer desorption starting from the dot-top. In a second step the model results are employed to refine the description of the growth process providing a now complete picture of the here relevant desorption mechanisms. The such calculated sticking coefficient matches quantitatively our temperature-dependent measurements of the critical time up to quantum dot formation.
引用
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页码:1 / 4
页数:4
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